{"id":291484,"date":"2024-10-19T19:47:30","date_gmt":"2024-10-19T19:47:30","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bsi-pd-iso-ts-251382019-tc\/"},"modified":"2024-10-25T16:49:52","modified_gmt":"2024-10-25T16:49:52","slug":"bsi-pd-iso-ts-251382019-tc","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bsi-pd-iso-ts-251382019-tc\/","title":{"rendered":"BSI PD ISO\/TS 25138:2019 – TC"},"content":{"rendered":"
PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
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52<\/td>\n | undefined <\/td>\n<\/tr>\n | ||||||
57<\/td>\n | Foreword <\/td>\n<\/tr>\n | ||||||
59<\/td>\n | 1 Scope 2 Normative references 3 Terms and definitions <\/td>\n<\/tr>\n | ||||||
60<\/td>\n | 4 Principle 5 Apparatus 5.1 Glow-discharge optical-emission spectrometer 5.1.1 General 5.1.2 Selection of spectral lines <\/td>\n<\/tr>\n | ||||||
61<\/td>\n | 5.1.3 Selection of glow-discharge source type <\/td>\n<\/tr>\n | ||||||
62<\/td>\n | 6 Adjusting the glow-discharge spectrometer system settings 6.1 General 6.2 Setting the parameters of a DC source 6.2.1 Constant applied current and voltage <\/td>\n<\/tr>\n | ||||||
63<\/td>\n | 6.2.2 Constant applied current and pressure <\/td>\n<\/tr>\n | ||||||
64<\/td>\n | 6.2.3 Constant voltage and pressure 6.3 Setting the discharge parameters of an RF source 6.3.1 General 6.3.2 Constant applied voltage and pressure <\/td>\n<\/tr>\n | ||||||
65<\/td>\n | 6.3.3 Constant applied power and DC bias voltage 6.3.4 Constant effective power and RF voltage 6.4 Minimum performance requirements 6.4.1 General <\/td>\n<\/tr>\n | ||||||
66<\/td>\n | 6.4.2 Minimum repeatability 6.4.3 Detection limit <\/td>\n<\/tr>\n | ||||||
67<\/td>\n | 7 Sampling <\/td>\n<\/tr>\n | ||||||
68<\/td>\n | 8 Calibration 8.1 General 8.2 Calibration samples 8.2.1 General 8.2.2 Low alloy iron or steel samples <\/td>\n<\/tr>\n | ||||||
69<\/td>\n | 8.2.3 Stainless-steel samples 8.2.4 Nickel alloy samples 8.2.5 Copper alloy samples 8.2.6 Titanium alloy samples 8.2.7 Silicon samples 8.2.8 Aluminium alloy samples 8.2.9 High-oxygen samples 8.2.10 High-carbon samples 8.2.11 High-nitrogen samples 8.2.12 High-hydrogen samples 8.2.13 High-purity copper samples <\/td>\n<\/tr>\n | ||||||
70<\/td>\n | 8.3 Validation samples 8.3.1 General 8.3.2 Hot-rolled low-alloy steel 8.3.3 Oxidized silicon wafers 8.3.4 TiN-coated samples 8.3.5 Anodized Al2O3 samples 8.3.6 TiO2-coated samples 8.4 Determination of the sputtering rate of calibration and validation samples <\/td>\n<\/tr>\n | ||||||
72<\/td>\n | 8.5 Emission intensity measurements of calibration samples 8.6 Calculation of calibration formulae 8.7 Validation of the calibration 8.7.1 General <\/td>\n<\/tr>\n | ||||||
73<\/td>\n | 8.7.2 Checking analytical accuracy using bulk reference materials 8.7.3 Checking analytical accuracy using metal oxide reference materials 8.8 Verification and drift correction <\/td>\n<\/tr>\n | ||||||
74<\/td>\n | 9 Analysis of test samples 9.1 Adjusting discharge parameters 9.2 Setting of measuring time and data acquisition rate 9.3 Quantifying depth profiles of test samples <\/td>\n<\/tr>\n | ||||||
75<\/td>\n | 10 Expression of results 10.1 Expression of quantitative depth profile 10.2 Determination of metal oxide mass per unit area <\/td>\n<\/tr>\n | ||||||
76<\/td>\n | 10.3 Determination of the average mass fractions of the elements in the oxide 11 Precision <\/td>\n<\/tr>\n | ||||||
77<\/td>\n | 12 Test report <\/td>\n<\/tr>\n | ||||||
78<\/td>\n | Annex A (informative) Calculation of calibration constants and quantitative evaluation ofdepth profiles <\/td>\n<\/tr>\n | ||||||
90<\/td>\n | Annex B (informative) Suggested spectral lines for determination of given elements <\/td>\n<\/tr>\n | ||||||
92<\/td>\n | Annex C (informative) Examples of oxide density and the corresponding quantity \u03c1O <\/td>\n<\/tr>\n | ||||||
93<\/td>\n | Annex D (informative) Report on interlaboratory testing of metal oxide films <\/td>\n<\/tr>\n | ||||||
98<\/td>\n | Bibliography <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" Tracked Changes. Surface chemical analysis. Analysis of metal oxide films by glow-discharge optical-emission spectrometry<\/b><\/p>\n |