BS EN 62374-1:2010:2011 Edition
$102.76
Semiconductor devices – Time-dependent dielectric breakdown (TDDB) test for inter-metal layers
Published By | Publication Date | Number of Pages |
BSI | 2011 | 20 |
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This part of IEC 62374 describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor devices.
Status | Definitive |
---|---|
Pages | 20 |
Publication Date | 2011-06-30 |
ISBN | 978 0 580 75206 3 |
Standard Number | BS EN 62374-1:2010 |
Title | Semiconductor devices – Time-dependent dielectric breakdown (TDDB) test for inter-metal layers |
Identical National Standard Of | EN 62374-1:2010/AC:2011, IEC 60809:2014/AMD1:2017 |
Corrects | BS EN 62374-1:2010 |
Descriptors | Electrical measurement, Semiconductors, Dielectric breakdown, Life (durability), Testing conditions, Semiconductor devices, Films (states of matter) |
Publisher | BSI |
Committee | EPL/47 |
ICS Codes | 43.040.20 - Lighting, signalling and warning devices |
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