AS ISO 17560:2006
$27.30
Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth profiling of boron in silicon
Published By | Publication Date | Number of Pages |
AS | 2006-10-20 | 20 |
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Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.
Published Code | AS |
---|---|
Published By | Australia Standards |
Publication Date | 2006-10-20 |
Pages Count | 20 |
Language | English |
Edition | 1 |
File Size | 358.4 KB |
ISBN | 0733777872 |
ICS Codes | 71.040.40 - Chemical analysis |
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